| 摘要 |
PURPOSE:To provide a positive, photosensitive planographic plate or a photoresist excellent in sensitivity and exposed picture visibility by permitting the absorbance of a composition itself to meet a specific expression. CONSTITUTION:This positive photosensitive composition contains a 1, 2- naphtoquinonediazide-4-sulfonic acid ester compound of a novolak resin containing polyhydric phenol; an alkaline-soluble resin; a compound that produces an acid when exposed; and a pigment having an absorption maximum in the range 550-650nm and decolored by acids. The composition meets the expression before an image is exposed. Any resin that is usable as a binder can be used as the alkaline-soluble resin, and novolak resins, vinyl polymer resins or combinations of them are preferably used as the alkaline-soluble resin. The compound producing acid when exposed is a trihalomethyl-triazine, or halomethyl-vinyl-oxadiazole, compound, etc. The pigment is a diphenylmethane pigment or an indoaniline pigment, etc. |
