发明名称 EXPOSURE DEVICE
摘要 PURPOSE:To enable the wavelength of an exposure laser beam to be shortened and to enable high-density recordings by solving problems with the color correction of an objective lens and to enable cost reduction by eliminating the need for using more than one laser beam source. CONSTITUTION:An exposure laser beam emitted from a laser beam source 11 is collected by an objective lens 14 and applied to a glass original board 1 to perform exposure for recording data, and when the objective lens 14 is focus-servoed using the beam reflected from the glass original board 1, the controller 17 controls a power controller 12 so that at the unexposed part of a mirror portion, etc., the intensity of the laser beam is lowered to a value at which a photoresist is not exposed while focus-servo can be achieved.
申请公布号 JPH07199481(A) 申请公布日期 1995.08.04
申请号 JP19940000830 申请日期 1994.01.10
申请人 SONY CORP 发明人 YAMATSU HISAYUKI;KAI SHINICHI
分类号 G03F7/20;G11B7/26;H01L21/027;(IPC1-7):G03F7/20 主分类号 G03F7/20
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