| 摘要 |
PURPOSE:To provide a photosensitive material having a surface that resists adhering to the back surface of a support even if it is preserved in a stack in a condition of high humidity and high pressure. CONSTITUTION:A photosensitive material is provided in which two or more layers each containing silver halide, a reducing agent and either a polymeric compound or polymer which are joined together or separated, or two or cross- linking more layers each containing a photopolymerization initiator and either a polymeric compound or bridging polymer which are joined together or separated, are provided on a support having a hydrophilic back surface, with the farthest layer from the support being a hydrophilic layer containing a hydrophilic polymer and having droplets or fine particles of a hydrophobic material dispersed therein. |
