| 摘要 |
Lacquer films sensitive to ultraviolet (UV) and/or electron beam radiation are applied to substrates as masking layers by a process known as the "spin on process". This invention is a new method of applying a lacquer film sensitive to UV and/or electron beam radiation. A vinyl-containing substance and a linear or cyclic siloxane are vaporized and then deposited onto the substrate to be masked. In the preferred embodiment of the invention, the substances utilized are octamethylcyclotetrasiloxane and trivinylmethylsilane. |
