CLEANING AGENT AND METHOD

摘要

A cleaning agent comprising 0.1-4 wt.% of hydrofluoric acid, 50-1,500 ppm of a surfactant represented by the following general formula (1): RfCOONH4 or 50-100,000 ppm of a surfactant represented by the following general formula (2): Rf'O(CH2CH2O)nR or (3): Rf'(CH2CH2O)nR, and the balance consisting of water; and a method of cleaning the surface of a silicon wafer, etc., by using the same. In formula (1) Rf represents a C5-C9 fluorohydrocarbon group, in formula (2) or (3) Rf' represents a C5-C15 fluorohydrocarbon group; R represents hydrogen or C1-C4 alkyl; and n represents a number of 5 to 20.