发明名称 Microstructure, process for manufacturing thereof and devices incorporating the same.
摘要 <p>A microstructure comprising a substrate (1), a patterned structure (beam member) (2) suspended over the substrate (1) with an air-space (4) therebetween and supporting structure (3) for suspending the patterned structure (2) over the substrate (1). The microstructure is prepared by using a sacrificial layer (7) which is removed to form the space between the substrate (1) and the patterned structure (2) adhered to the sacrificial layer. In the case of using resin as the material of the sacrificial layer, the sacrificial layer can be removed without causing sticking, and an electrode can be provided on the patterned structure. The microstructure can have application as electrostatic actuator etc., depending on choice of shape and composition. <IMAGE></p>
申请公布号 EP0665590(A2) 申请公布日期 1995.08.02
申请号 EP19950300521 申请日期 1995.01.27
申请人 CANON KABUSHIKI KAISHA 发明人 YAGI, TAKAYUKI, C/O CANON K.K.;AKAIKE, MASATAKE, C/O CANON K.K.
分类号 B81B3/00;B81C1/00;G03F7/00;H01H59/00;H01L23/00;H02N1/00;H02N2/00;H02N2/02;(IPC1-7):H01L23/00;G01B7/00 主分类号 B81B3/00
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