发明名称 Semiconductor structure and method of fabricating the same.
摘要 <p>A semiconductor structure includes a first semiconductor barrier layer formed on a compound semiconductor substrate, a semiconductor carrier confinement layer formed on the semiconductor barrier layer, and a second semiconductor barrier layer arranged on the semiconductor carrier confinement layer. The semiconductor carrier confinement layer includes a plurality of islands spaced apart from each other and having an almost equal thickness, and a thin quantum well film arranged between the islands and having a thickness smaller than the thickness of the islands. <IMAGE></p>
申请公布号 EP0665578(A2) 申请公布日期 1995.08.02
申请号 EP19940118561 申请日期 1994.11.25
申请人 NIPPON TELEGRAPH AND TELEPHONE CORPORATION 发明人 NOETZEL, RICHARD;TEMMYO, JIRO;TAMAMURA, TOSHIAKI;SUGO, MITSURU;KURAMOCHI, EIICHI;NISHIYA, TERUHIKO
分类号 G02F1/017;H01L33/06;H01S5/32;H01S5/34;H01S5/343;(IPC1-7):H01L21/205;G02F1/015;H01S3/19;H01L33/00 主分类号 G02F1/017
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