| 摘要 |
PURPOSE:To provide a pattern defect inspection device, by which the clean level can be improved so as to detect a defect of a substrate as a subject for inspection by a simple work. CONSTITUTION:An inspection mask 8 is fixed on a mask holder 5 and a glass substrate 7 is fixed on a substrate stage 21 by vacuum suction. The substrate stage 21 is lifted in the direction of a Z-axis, and lifted while the parallelism of the glass substrate 7 to the inspection mask 8 is kept and stopped in a position where the clearance ranges from several tens mum to several hundreds mum. The glass substrate 7 and the inspection mask 8 are aligned in such a manner that a worker is easiest to test. As patterns 7p, 8p overlap each other in a part outside the patterns 7p, 8p, transmitted light from a back light 22 is interrupted by the whole surfaces of the glass substrate 7 and the inspection mask 8. As light from the back light 22 is passed through a defective part S not being obstructed b the pattern 7p of the glass substrate 7 and the pattern 8p of the inspection mask 8, the defective part S becomes a luminescent spot so as to be easily found. |
