| 发明名称 |
TREATMENT OF A CHEMICAL |
| 摘要 |
A process for treating dissociated zircon comprises reacting dissociated zircon with gaseous hydrogen fluoride at an elevated reaction temperature. The reaction temperature is controlled to obtain at least one desired zirconium-based compound and at least one desired silicon-based compound.
|
| 申请公布号 |
CA2141162(A1) |
申请公布日期 |
1995.08.01 |
| 申请号 |
CA19952141162 |
申请日期 |
1995.01.26 |
| 申请人 |
ATOMIC ENERGY CORPORATION OF SOUTH AFRICA LIMITED |
发明人 |
NEL, JONATHAN |
| 分类号 |
C01B33/107;C01B33/12;C01G25/02;C01G25/04;(IPC1-7):C01G25/02;C01B33/037;C01B33/10 |
主分类号 |
C01B33/107 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
