| 摘要 |
PURPOSE:To provide a desired reflector by freely controlling the the inclination of the recess and protrusion on the reflector surface. CONSTITUTION:Recess and protrusion forming layers 3 and 4 having different etching rates and a resist pattern 5 are laminated on a substrate 1 forming a reflector, and photolithography and etching are applied to form recess and protrusion. At this time, the recess and protrusion having an inclination angle corresponding to the etching rate of the laminated film are formed. A reflecting layer 6 is further laminated thereon to form a reflector. |
