| 摘要 |
PURPOSE:To provide a positive photosensitive resin compsn. which has good solubility of a photosensitive agent, has good wet spreadability with a substrate and has high resolution and a process for producing a resist image using the same. CONSTITUTION:This positive photosensitive resin compsn. contains (A) an alkaline aq. soln.-soluble resin, (B) a compsn. having a naphthoquinone diazde group as a photosensitive agent and (C) a compsn. having two pieces of ketone groups in one molecule as a solvent. The process for producing the resist image by applying this positive photosensitive resin compsn. on a substrate and drying the coating, then exposing and developing the compsn. is obtd. |
