发明名称 Irradiation device for X-ray lithography
摘要 The device comprises an object table (3) mounted on an adjustable support (2) inside the X-ray vacuum chamber (1). The movable support is linked to the chamber and to the support structure (7) by a first rubber membrane (9). The adjustable supporting structure is terminated by a vacuum wall (11) at the bottom, spaced from a second vacuum wall (12) to form a secondary vacuum chamber. The two walls are separated by a second rubber membrane (10). The secondary vacuum chamber is linked to the main vacuum chamber by a vacuum line (15) to equalise the pressures. The object, comprising a resistible covered substrate and a mask is held on the object table via a support layer and a pressure ring which prevents rotation. The adjustment comprises fine and coarse adjusting supports.
申请公布号 DE4418779(C1) 申请公布日期 1995.07.27
申请号 DE19944418779 申请日期 1994.05.28
申请人 JENOPTIK TECHNOLOGIE GMBH, 07745 JENA, DE 发明人 SEHER, BERND, 07747 JENA, JP;REUTHER, FRANK, 07745 JENA, DE;NEULAND, RUDI, 99510 SCHOETEN, DE;MUELLER, LUTZ, 07747 JENA, JP
分类号 G03F7/20;G03F9/00;G21K5/02;H01L21/027;(IPC1-7):G03F7/20 主分类号 G03F7/20
代理机构 代理人
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