| 发明名称 |
Photoresist. |
| 摘要 |
<p>A description is given of photocurable and solvent-developable compositions based on photopolymerisable (meth)acrylates, a photo initiator for (meth)acrylates, and an organic polymeric binder containing free carboxyl groups and having an acid value of at least 60, a blocked polyisocyanate crosslinking agent which has a cleavage temperature of at least 100 DEG C, and an inert solvent in an amount such that the photocurable composition can be poured.</p> |
| 申请公布号 |
EP0402894(B1) |
申请公布日期 |
1995.07.26 |
| 申请号 |
EP19900111192 |
申请日期 |
1990.06.13 |
| 申请人 |
CIBA-GEIGY AG |
发明人 |
KURT, MEIER, DR.;LUNN, ROBERT JAMES, DR.;KROEHNKE, CHRISTOPH, DR.;EUGSTER, GIULIANO |
| 分类号 |
C08F290/06;C08G18/67;C09D4/00;C09D4/06;C09D5/00;C09D11/10;C09D175/00;C09D175/04;G03F1/10;G03F7/027;G03F7/028;G03F7/033;H01L21/027;H01L21/30;H05K3/06;(IPC1-7):G03F7/027 |
主分类号 |
C08F290/06 |
| 代理机构 |
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代理人 |
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| 地址 |
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