发明名称 Field effect transistor
摘要 The invention provides a FET by forming a channel layer in layer including "n" type impurity at high concentration, which is sandwiched by a first semiconductor layer and a second semiconductor layer lightly doped with impurity. Therefore even when electrons in the channel layer obtain high energy, the electrons in this arrangement rush out essentially to the second semiconductor layer excelling in electron carrying characteristic, thus a travelling speed of the electrons in the channel layer is not lowered. Furthermore the channel layer being formed in layer and allowed to include impurity at high concentration, the current drive capability can be improved.
申请公布号 US5436470(A) 申请公布日期 1995.07.25
申请号 US19920818537 申请日期 1992.01.09
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 NAKAJIMA, SHIGERU
分类号 H01L29/812;(IPC1-7):H01L29/161;H01L29/205 主分类号 H01L29/812
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