发明名称 |
Process for the electrodeposition of an amorphous cobalt-iron-phosphorus alloy |
摘要 |
A thin amorphous alloy of cobalt, iron and phosphorus having good workability and the ability to be used as a soft magnetic material is formed by electrolytic deposition. The electrolytic bath has a pH of 1.0 to 2.2 and contains at least a divalent cobalt ion, a divalent iron ion, and phosphorous acid and/or a phosphite. The amorphous alloy contains at least 69 atomic percent cobalt, 2 to 30 atomic percent phosphorus and the iron/(cobalt+iron) atomic ratio is from 0.001 to 0.1. The alloy may be deposited on a working electrode having a chrome-plated surface with a center line average roughness of less than 1 mu m and may be peeled from the electrode to obtain a tape-shaped or foil-shaped product.
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申请公布号 |
US5435903(A) |
申请公布日期 |
1995.07.25 |
申请号 |
US19920974668 |
申请日期 |
1992.11.12 |
申请人 |
MITSUBISHI RAYON COMPANY, LTD. |
发明人 |
ODA, MASAHARU;OHASHI, HIDEHIKO;KAMADA, KENSUKE |
分类号 |
C25D3/56;H01F10/13;H01F41/26;H05K3/24;H05K9/00;(IPC1-7):C25D1/04 |
主分类号 |
C25D3/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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