PATTERN FORMING METHOD

摘要

PURPOSE:To stably form a pattern having high resolution and excellent in dry etching resistance. CONSTITUTION:A photosensitive layer contg. an arom. compd. is formed on a substrate and a photochemical reaction is allowed to take place in the photosensitive layer by patternwise exposing the layer with light having wavelength shorter than the max. wavelength of the 3rd absorption band of the absorption spectrum of the arom. compd. from the long wavelength side and longer than the max. wavelength of the 4th absorption band. The photosensitive layer is then heat-treated if necessary and it is developed to selectively remove or leave the exposed part of the photosensitive layer.