Procédé pour déposer, à la température ambiante, une couche de métal ou de semi-métal et leur oxyde sur un substrat.

摘要

A method for depositing on a substrate (14) a film consisting of a metal or semi-metal and an oxide thereof belonging to groups IIb, IIIa, IVa and Va of the periodic table, wherein a remote cold nitrogen plasma essentially consisting of free nitrogen atoms is generated in an enclosure (13) in order to pretreat the substrate, and once said substrate (14) has been pretreated with said remote cold nitrogen plasma, a volatile alkyl of said metal or semi-metal (10) is fed into the enclosure (13) in order to decompose said alkyl and form on said substrate (14) a film consisting of a mixture of the metal or semi-metal and the oxide thereof.