发明名称 |
MONOLITHIC INTEGRATION LASER, LIGHT SOURCE FOR ELECTRONIC ABSORBER AND MANUFACTURE THEREOF |
摘要 |
PURPOSE: To monolithically integrate and form a DFB or DBR laser and a modulator by using organic metal gas phase epitaxy, for a patternized board. CONSTITUTION: A selectively deposited GaInAsP layer 12, an InP layer 13, a confinement heterostructure layer 14 and a p-type InP layer 15 are formed, on a polished n-type InP substrate 11. This confinement heterostructure layer 14 and the p-type InP layer 15 are formed by growing a strained GaInAs quantum well having four barrier layers by organic metal gas phase epitaxy. A polyimide layer 18 is deposited selectively on this element, and blocks a current to a region where a modulator 19 and a laser 20 are not formed. A reflection preventing coating 21 is applied onto the cleaved surface of this element. Consequently, it becomes possible to manufacture high-efficiency elements wherein modulators and lasers are combined. |
申请公布号 |
JPH07183623(A) |
申请公布日期 |
1995.07.21 |
申请号 |
JP19940305711 |
申请日期 |
1994.11.16 |
申请人 |
AMERICAN TELEPH & TELEGR CO <ATT> |
发明人 |
ANDORIYUU GONPERUTSU DENTAI;KOYAMA FUMIO;KANNII RIYUU |
分类号 |
H01L33/00;H01S5/00;H01S5/026;H01S5/20;H01S5/227;H01S5/32;H01S5/343;H01S5/50 |
主分类号 |
H01L33/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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