| 摘要 |
<p>PURPOSE:To provide a mask alignment inspecting method and inspecting device capable of inspecting alignment accuracy with high accuracy. CONSTITUTION:A reference cumulative histogram (H(R)) is determined from a light intensity profile (R(x)) for reference obtd. by irradiating a reference measurement mark with light and an inspection cumulative histogram (H(M)) is determined from a light intensity profile (M(x)) for inspection obtd. by irradiating a measurement mark for inspection with light. The lightlintensity profile (M(x)) for inspection is corrected by subjecting the light intensity profile (M(x)) for inspection to image stressing so as to equalize the cumulative frequency (H(M)) of the inspection cumulative histogram and the cumulative frequency (H(R)) of the reference cumulative histogram (H(R)). The respective positions of the plural patterns are detected therefrom and the alignment accuracy between the plural masks corresponding to each of the plural patterns is inspected from these positions.</p> |
