| 摘要 |
PURPOSE:To improve the exposure alignment precision by a method wherein respective correction values are determined in consideration of the effect of the magnaification of a projection optical system and the position of an original plate on the position of the project image of a measuring mark. CONSTITUTION:In order to measure the pattern position of a reticle 20 projected on a plate 11 using an exposure device 10, the data if measured values and the position of a measuring mark of the reticle 20 projected on the plate 11, the position of the measuring mark on the reticle 20 as well as the slippage of the second image to be overlapped with the first image in said measurement are to be minimized or if the difference on the overlap in the adjoining parts in respective shots when the second image comprising plural shots are overlapped is to be minimized are inputted in a computer 21. Next, this computer 21 decides the applicable correction formulae according to these data so as to decide the correction values of respective correction formulae for minimizing the slippage amount as for respective measuring marks obtained when said data are furnished to correction formulae for performing the alignment control according to the decided correction values. |
