| 摘要 |
<p>PURPOSE:To prevent contamination due to treatment liquid on the rear surface of a substrate to be treated. CONSTITUTION:A substrate 1 is fixed to a substrate support member 2 by vacuum-sucking. Downwardly of the substrate 1, a wider discoid rotary member than the substrate 1 is arranged with a space of several mm. When scrubbing, etc., is performed on the surface (to be treated) of the substrate 1, the substrate 1, substrate support member 2, and rotary member 3 are integrally simultaneously rotated. Thus, if the substrate 1 is rectangular, as it is hard that an eddy air current generates round the substrate 1, it is possible to suppress contamination caused by invading the treatment liquid supplied to the surface of the substrate 1 to the rear surface. Further, after the treatment is finished, the substrate support member 2 is lifted up, so that a detergent nozzle 12 can invade under the substrate 1 to supply the detergent from this detergent nozzle 12 to the rear surface of the substrate 1. Thereby, if contamination generates on the rear surface, it is finally removed. Thus, it is possible to prevent the contamination due to the treatment liquid on the rear surface of substrate.</p> |
