发明名称 GAS FADE RESISTANT ULTRAVIOLET ADDITIVE FORMULATIONS FOR POLYETHYLENE
摘要 <p>A polyethylene composition for use in fabricating films, agricultural films, molded articles, sheets, fibers, and other articles, where resistance to ultraviolet degradation and color formation is achieved. The polyethylene composition will include a polyethylene, tris-(3,5-di-tert-butyl-4-hydroxybenzyl) isocyanurate, or an alpha tocopherol as a primary antioxidant, one or more polymeric hindered amine light stabilizers, and optionally one or more secondary antioxidants and one or more acid neutralizers. The excellent UV stability and gas fade resistance (resistance to color formation from gases) is achieved by the above combination; however, the result is unexpected because the primary antioxidants have melting points above the compounding temperature of polyethylenes. This would be expected to create uneven dispersion of the antioxidant, resulting in variable product performance. However, the combination gives consistent and excellent UV and gas fade resistance.</p>
申请公布号 WO1995019391(A1) 申请公布日期 1995.07.20
申请号 US1995000510 申请日期 1995.01.13
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址