发明名称 |
System for depositing material on a substrate. |
摘要 |
A system (10) for locally controlling the deposition of material onto a wafer (14) includes a plasma puck (32) that locally contains a plasma such that a plasma assisted chemical vapor transport process deposits material in a localized controlled region. <IMAGE> |
申请公布号 |
EP0663457(A1) |
申请公布日期 |
1995.07.19 |
申请号 |
EP19950100221 |
申请日期 |
1995.01.09 |
申请人 |
HUGHES AIRCRAFT COMPANY |
发明人 |
NESTER, JAMES F.;ZAROWIN, CHARLES B. |
分类号 |
C23C16/04;C23C14/04;C23C14/54;C23C16/50;C23C16/52;H01L21/205 |
主分类号 |
C23C16/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|