发明名称 |
Method and apparatus for tuning field for plasma processing using corrected electrode. |
摘要 |
A device for reducing plasma irregularities includes an electrode assembly capable of applying an electric potential to said plasma. The electrode assembly includes a portion for reducing the plasma irregularities. The portion which reduces the plasma irregularities includes alternately a buried portion which is capable of altering the potential within the buried element, or else a conditioned portion of the surface which controls reflectivity and/or emissivity of portions of a surface of the electrode assembly differently. <IMAGE> |
申请公布号 |
EP0663682(A1) |
申请公布日期 |
1995.07.19 |
申请号 |
EP19940119741 |
申请日期 |
1994.12.14 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
DALVIE, MANOJ;GUARNIERI, C. RICHARD;MCGILL, JAMES J.;RUBLOFF, GARY W.;SELWYN, GARY S.;SURENDRA, MAHESWARAN |
分类号 |
H05H1/46;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;H01L21/683 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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