发明名称 NEW ABRASIVE SLURRY
摘要 <p>A polishing slurry comprises diamond particles finer than 5 micron in the ratio 1:30-90 to alpha-alumina particles having an average size of 20-200 nm and sufficient suspending agent to maintain the diamond particles in suspension. Also claimed is a slurry as above contg. 1-10 carat/litre 0.2-1.0 micron diamond and 30-90 g/litre 40-100 nm alpha-alumina particles, wherein the diamond:alumina ratio is 1:40-80.</p>
申请公布号 JPH07179848(A) 申请公布日期 1995.07.18
申请号 JP19940000554 申请日期 1994.01.07
申请人 SAINT GOBAIN NORTON IND CERAMICS CORP 发明人 DEBITSUDO ROSUTOKAA
分类号 C09K3/14;B24B37/00;C09C1/68;C09G1/02;(IPC1-7):C09K3/14 主分类号 C09K3/14
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