| 摘要 |
<p>PURPOSE:To provide a device for anodizing a liq. crystal substrate capable of more uniformly anodizing the gate pattern of the glass substrate. CONSTITUTION:A glass substrate G is dipped in a tank 21 to remove the oxide film on the gate pattern surface and an impurity-coated film, then dipped in a tank 31 and rinsed, and the surface is exposed. The substrate is isolated from the external air by the upper and lower shutters 24 to prevent the secondary contamination of the oxide film-free sheet. The tanks 21 and 31 and an underwater moving tank 41 and the tanks 31 and 41 and an anodization tank 51 are shielded by the upper and lower shutters 26 and shielding plate 47. The atmosphere in the tank 51 is shielded by the plate 47 and isolated from the atmosphere around the tank 51 by dipping the substrate G in the tank 51, the substrate is dipped in a processing soln. 22 while preserving the gate pattern surface, and the uniformity and stability of anodization are maintained.</p> |
