发明名称 |
Spinning reticle scanning projection lithography exposure system and method |
摘要 |
A reticle disk with an annular pattern area is used in a reduction projection lithography system in place of a reticle with a rectilinear pattern layout. The reticle disk is rotated on a continuous basis during patterning of a substrate, and the patterning-beam emanating from the annular pattern area is scanned over the substrate using an X-Y stage. The imaging beam, which is preferably an electron-beam, may be scanned across the annular pattern area in a radial direction to allow patterning a plurality of subfields.
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申请公布号 |
US5434424(A) |
申请公布日期 |
1995.07.18 |
申请号 |
US19940310176 |
申请日期 |
1994.09.21 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
STICKEL, WERNER;KENDALL, RODNEY A. |
分类号 |
G03F7/20;H01J37/317;H01L21/027;(IPC1-7):H01J37/317;G03B27/46;G21K1/06 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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