| 摘要 |
A surface ion source apparatus (10) creates a high purity ion beam (44) of molecules of metal compounds having a lower ionization energy than the metal they contain. Low energy dispersion in the ion beam and currents on the order of one ampere are attainable over long duration operation. Rhenium screen (12) is used in the ion source and related catalyzer (31). Temperatures vary in the range of 700 to 2500 degrees centigrade and a preferred vacuum pressure of 10<-5> torr, or lower, is used. Wear and corrosion resistance of a wide variety of materials is greatly enhanced through ion deposition and/or implantation with the disclosed apparatus and methods.
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