首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
Method and apparatus for sputtering.
摘要
申请公布号
EP0148504(B2)
申请公布日期
1995.07.12
申请号
EP19840116391
申请日期
1984.12.27
申请人
HITACHI, LTD.
发明人
SAITO, HIROSHI;TATEISHI, HIDEKI;KOBAYASHI, SHIGERU;AIUCHI, SUSUMU;SUZUKI, YASUMICHI;SAKATA, MASAO;SHIMAMURA, HIDEAKI;KAMEI, TSUNEAKI
分类号
C23C14/36;C23C14/34;C23C14/35;C23C14/46;H01J37/34;H01L21/203;H01L21/31;(IPC1-7):C23C14/34
主分类号
C23C14/36
代理机构
代理人
主权项
地址
您可能感兴趣的专利
CYCLIC WAVE ENERGY CONVERSION SYSTEM
STRUCTURAL REINFORCEMENTS
Imaging apparatus and a device for use therewith
Ice chest air conditioner
Switch structure and electronic device
AUTOMATIC AUXILIARY LIGHTING UNIT
Novel flame retardant nanoclay
Inlet device for a fluid fed tangentially into an apparatus
APPARATUS, SYSTEM, AND METHOD FOR MULTIFUNCTIONAL PIN IN AN INTEGRATED CIRCUIT
MOLDING DIE FOR MOLDING GLASS AND REPRODUCING METHOD THEREOF
Form filling lens
BENZOFURANS AS POTASSIUM ION CHANNEL MODULATORS
OPTICAL APPARATUS, IMAGING APPARATUS, AND CONTROL METHOD
Apparatus and method for producing electromagnetic oscillations
Tungsten polymer collimator for medical imaging
NONVOLATILE MEMORY SYSTEM, AND DATA READ/WRITE METHOD FOR NONVOLATILE MEMORY SYSTEM
DISK DEVICE, AND POSITION DETERMINATION METHOD FOR PICKUP HEAD
Method and System For Providing A Viewable Virtual Information Center
METHOD FOR PRODUCING AN INTEGRATED CIRCUIT INDLCUDING A SEMICONDUCTOR
Providing dynamically controlled CQI technique adapted for available signaling capacity
