发明名称 High withstand voltage M I S field effect transistor and semiconductor integrated circuit
摘要 A semiconductor integrated circuit device is provided in which a highly reliable and low cost intelligent power semiconductor is mounted on the same substrate as that of a control circuit having a logic element, such as a low withstand voltage CMOS etc., and high withstand voltage and high current output MIS field effect transistor. A high withstand voltage MOSFET is composed of a vertical MOS portion 25 formed in one side of a laterally widened well layer 2 and a drain portion formed in the other side thereof and a second base layer 4 is formed on the surface of the well layer 2. Accordingly, a depletion layer widened just under the MOS portion 25 and the second base layer 4 develops a JFET effect at OFF time thereby realizing a high withstand voltage and reliability is provided since the generation of hot carriers can be prevented by the second base layer 4.
申请公布号 US5432370(A) 申请公布日期 1995.07.11
申请号 US19940319774 申请日期 1994.10.07
申请人 FUJI ELECTRIC CO., LTD. 发明人 KITAMURA, AKIO;FUJISHIMA, NAOTO;TADA, GEN
分类号 H01L21/8238;H01L27/04;H01L27/088;H01L27/092;H01L29/06;H01L29/10;H01L29/40;H01L29/78;(IPC1-7):H01L29/10 主分类号 H01L21/8238
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