发明名称 Method for adhering diamondlike carbon to a substrate
摘要 The electrical field at the surface of an electrode is graded by depositing a semiconductive coating thereon. An electrode substrate is powered at a preselected temperature and power. A mixture of gases is then passed through an electrical discharge to ionize at least a portion thereof to form the semiconductive coating on the surface of the electrode. A diamondlike carbon (DLC) film is deposited by plasma enhanced chemical vapor deposition onto a substrate. A substrate is maintained at a preselected DLC forming temperature and is negatively biased at a first preselected voltage. A first gaseous mixture of hydrocarbons and argon is then passed through an electrical discharge to at least partially ionize the hydrocarbons to form DLC film on the substrate. The substrate is then negatively biased at a second preselected voltage lower than the first preselected voltage. A second gaseous mixture of hydrocarbons and argon or hydrogen is then passed through the electrical discharge to at least partially ionize the hydrocarbons to form additional DLC film on the substrate.
申请公布号 US5431963(A) 申请公布日期 1995.07.11
申请号 US19940215955 申请日期 1994.03.18
申请人 GENERAL ELECTRIC COMPANY 发明人 RZAD, STEFAN J.;DEVRE, MICHAEL W.
分类号 C23C16/02;C23C16/26;H01G4/14;(IPC1-7):B05D3/06 主分类号 C23C16/02
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