发明名称 Electrical interconnect using particle enhanced joining of metal surfaces
摘要 A method and apparatus for electrically interconnecting various electronic elements, including circuit components, assemblies, and subassemblies. A particle enhanced material metal contact layer, having a surface, formed on the electronic elements, includes particles of greater hardness disposed on and/or within the metal contact layer, which particles form protuberances that concentrate stress when the contact surface is brought into contact with an opposing surface under pressure, to thereby penetrate the opposing surface and form a metal matrix between the two surfaces. The invention includes preferred and alternative embodiments incorporating particle enhanced material that provide a semiconductor test array which may be patterned as desired to receive an integrated circuit die and/or packaged components to facilitate integrated circuit and packaged electronic component testing; a probing device for testing integrated circuit die in situ on a semiconductor wafer; connectors for coupling discontinuous circuit element substrates; an interposer for interconnecting conventional components, circuit boards, and assemblies; and connectors for single and multiple layer circuit boards.
申请公布号 US5430614(A) 申请公布日期 1995.07.04
申请号 US19930148907 申请日期 1993.11.08
申请人 PARTICLE INTERCONNECT INC. 发明人 DIFRANCESCO, LOUIS
分类号 B23K20/16;B23K35/02;H01H1/06;H01M8/04;H01R43/00;H05K1/14;H05K3/32;H05K3/40;(IPC1-7):H01R23/68 主分类号 B23K20/16
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