发明名称 ANALYZING METHOD OF SAMPLE
摘要 PURPOSE:To judge the effect of pollution of a surface to be analyzed accurately depending on the number of Auger peaks appearing as a result of an analysis by eliminating possible repeated deposition of matters during the cleaning of the surface to be analyzed to form a clean surface to be analyzed. CONSTITUTION:A hole 12 having a bottom surface 12a is formed in a sample 11 using a focus ion beam and then, argon ions with an angle theta of incidence set 0 deg.-20 deg. for a side wall 12b of the hole 12 is made to irradiate the side wall 12b to remove a pollutant 31 deposited on the side wall 12b. Thereafter, the side wall 12b is analyzed by an Auger electron spectroscopy. When two Auger peaks of a element to be analyzed appear in the Auger electron spectroscopy, it is judged that the pollutant 31 containing at least the element to be analyzed is deposited on a part analyzed. When one Auger peak appears in the element to be analyzed, it is judged that none of the pollutant 31 containing at least the element to be analyzed is deposited on the part analyzed.
申请公布号 JPH07167807(A) 申请公布日期 1995.07.04
申请号 JP19930343013 申请日期 1993.12.14
申请人 SONY CORP 发明人 SAOTOME NOBUYUKI;HATAKE IZUMI
分类号 G01N23/227 主分类号 G01N23/227
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