发明名称 FIXED-QUANTITY POLLUTED STANDARD SAMPLE AND MANUFACTURE AND PRODUCTION DEVICE THEREOF
摘要 PURPOSE:To obtain a fixed-quantity polluted sample, in which a pollution element is distributed uniformly in a surface in low concentration, and the manufacture of the standard sample and a production device capable of manufacturing the standard sample with excellent reproducibility. CONSTITUTION:A sample (a wafer) W is mounted on a sample base 2 and moved in the XY directions of a plane, a fixed quantity of polluted liquids are dropped onto the surface of the sample W from a dropping instrument 4 installed to the upper section of the sample W, the dropping operation is repeated at a large number of places in one region of the surface of the sample, and a fixed quantity of the polluted liquids in constant concentration are dropped repeatedly at a large number of places at equal intervals on the surface of the sample, thus manufacturing a sample, in which the droplets of a fixed quantity of the polluted liquids in constant concentration are arranged at a large number of points in a latticed from at regular intervals on the surface.
申请公布号 JPH07169810(A) 申请公布日期 1995.07.04
申请号 JP19930342850 申请日期 1993.12.15
申请人 NEC CORP 发明人 HIROSHIMA SHOICHI
分类号 H01L21/66;G01N1/28;G01N21/00;G01N21/31;G01N23/00;H01L21/304 主分类号 H01L21/66
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