Method for rendering imaging member substrates non-reflective

摘要

A method of rendering nonreflective an imaging member substrate, preferably a photoreceptor substrate, involves etching the substrate with (a) an effective amount of an etching agent at a temperature sufficient to effect etching of the substrate, wherein the etching agent comprises (i) high purity deionized water, (ii) a mixture of high purity deionized water and a mild acid or (iii) a mixture of high purity deionized water and a base; or (b) a combination of the etching agent (a) and modulating ultrasonic energy. This method renders the substrate clean, spotless, and pristine, and provides it with uniform surface roughness.