| 摘要 |
<p>PURPOSE:To provide the diazo photosensitive material superior in adhesion to a photosensitive resin layer on an original image film and a copper-lined laminated plate and transmittance of ultraviolet rays through a nonimage part (transparent part), high in scratching resistance on the photosensitive layer and easy in touching of a photomask obtained from the diazo photosensitive material. CONSTITUTION:The diazo photosensitive material characterized by having an average light transmittance of >=40% in the wavelength region 300-500nm through the nonimage part (transparent part) is obtained by forming on a transparent support the 4-14mum thick photosensitive layer containing phenylphenol, N-(2'-hydroxy-lower-alkyl)-beta-resorcylamide, and a fine solid powder having an average particle diameter of 1.0-8.0mum, and the diazo compound represented by the formula in which each of R<1> and R<2> is lower alkyl and X is an anion.</p> |
