| 摘要 |
<p>PURPOSE:To prevent formation of image defects and heighten the production yield by applying voltage between neighboring electrodes of elements from an electric power source to carry out electric communication treatment so calles as forming and forming an electron emissive part with changed structure in the part of a thin film in which an electron emissive part is to be formed. CONSTITUTION:After an insulating substrate 1 is sufficiently cleaned with a detergent, pure water, and an organic solvent, element electrodes 5, 6 are formed on the insulating substrate 2 by photolithographic method. An organometallic thin film 7 is formed on the substrate 1 by applying an organometallic solution to the whole surface of the substrate 1 and keeping the substrate still. A mask 8 having a patterned shape for the thin film 7 is put on the substrate and light is radiated to the substrate from a light source and only the aiming patterned parts of the thin film 7 is heated and fired. The organometal in the parts which are not fired is removed by washing out with an organic solvent to form a thin film 2 with aiming patterned shape for electron emission. When voltage is applied to the electrodes 5, 6 to form an electron emission part 3, the emission part 3 is composed of metal fine particles and emits electrons.</p> |
