PROCESS FOR DEPOSITION OF DIAMONDLIKE, ELECTRICALLY CONDUCTIVE AND ELECTRON-EMISSIVE CARBON-BASED FILMS

摘要

A process for depositing amorphous or nanophase diamondlike carbon (DLC) and a-C:H carbon/hydrogen films with variable and controllable properties on the surface of the substrate is disclosed. The process, in a chamber (2'), utilizes a combined hydrocarbon ion beam and plasma-activated hydrocarbon gaseous flux (10') produced by an end-Hall ion source (3') to yield on a substrate (7') a film (6') with good electron-emissivity characteristics or high hardness and good transparency, as desired. A second ion source (4) providing a beam of argon ions (13) above or together in nitrogen (14) is optionally directed at the substrate for cleaning prior to deposition and for ion-assisted deposition during deposition or for doping.