| 发明名称 |
Method for in-situ cleaning a Ti target in a Ti + TiN coating process |
| 摘要 |
A novel method of in-situ cleaning a Ti target in a Ti+TiN anti-reflective coating process when such Ti and TiN deposition process are conducted in the same process chamber by the addition of a simple process step and without the use of a shutter.
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| 申请公布号 |
US5427666(A) |
申请公布日期 |
1995.06.27 |
| 申请号 |
US19930119769 |
申请日期 |
1993.09.09 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
MUELLER, MARK A.;GUO, XIN;EGERMEIER, JOHN C. |
| 分类号 |
C23C14/00;C23C14/06;C23C14/18;C23C14/56;(IPC1-7):C23C14/34;H01L21/203 |
主分类号 |
C23C14/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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