| 摘要 |
<p>A liquid deposition source delivery system (22) includes a reactant source (50) of a liquid chemical reactant, a first heater (54) positioned adjacent to the reactant source (50), and a vapor collection system (56) in communication with the reactant source (50) to collect vapor evolved from the reactant source (50). A flow controller (64) has an upstream side (66) in communication with the vapor collection system (56). A line (70) of a vapor distribution system is in communication with the downstream side (68) of the flow controller (64). A second heater (76) is positioned adjacent to the flow controller (64), at least a portion of the vapor collection system (56), and at least a portion of the vapor distribution system, to prevent the vapor from condensing in the lines (70) of the delivery system. One purge system (94) is used for the upstream side of the flow controller (64) and the vapor collection system (56), and a second purge system (96) is used for the downstream side of the flow controller (64) and the lines (70) of the vapor distribution system. <IMAGE></p> |
