发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 A semiconductor device and a method for forming the same. The semiconductor device comprises an insulating or semiconductor substrate, a thermally-contractive insulating film which is formed on said substrate and provided with grooves, and semiconductor film which is formed on the thermally-contractive insulating film and divided in an islandish form through the grooves. The thermally-contractive insulating film is contracted in a heat process after the semiconductor film is formed.
申请公布号 KR950006966(B1) 申请公布日期 1995.06.26
申请号 KR19920005090 申请日期 1992.03.27
申请人 SEMICONDUCTOR ENERGY CABORATORY CO., LTD. 发明人 YAMAJAKI, SUNPEI;TAKEMURA, YASUHIKO
分类号 G02F1/136;G02F1/1368;H01L21/20;H01L21/336;H01L21/762;H01L21/77;H01L21/84;H01L27/06;H01L27/092;H01L27/12;H01L29/04;H01L29/78;H01L29/786;(IPC1-7):H01L21/20 主分类号 G02F1/136
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