| 摘要 |
PURPOSE:To provide a substrate surface processing device which is capable of processing the surface of a substrate well by a method wherein processing liquid mist which is produced when processing liquid sprayed onto the surface of the substrate from a spray nozzle is made to rebound from the surface of the substrate is prevented from spreading. CONSTITUTION:A cylindrical cup-shaped processing liquid scattering preventing member 4 is mounted on a spray nozzle 3 so as to make its opening 5 confront the surface of a substrate and to cover a substrate surface region 2a on which processing liquid is sprayed from the spray nozzle 3. By this setup, as the processing liquid scattering preventing member 4 is made to limit a scattered region of processing liquid mist, processing liquid mist can be prevented from scattering, and as a result the surface of a substrate can be processed very well. |
