发明名称 SUBSTRATE SURFACE TREATMENT DEVICE
摘要 PURPOSE:To separately recorver a plurality of types of treatment liquid by simple constitution without enlarging the substrate surface treatment device so as to perform prescribed surface treatment on the surface of a substrate by subsequently supplying a plurality of types of treatment liquid on the surface of the substrate arranged in a substrate treatment space. CONSTITUTION:A cup 3 is arranged so as to surround a chuck 1, and a substrate treatment space 4 is formed. The cup 3 is connected to a collecting ox 6 and waste liquid collected in the cup 3 is collected to the collecting box 6. A waste liquid part 7 is connected to the bottom side plane of the collecting box 6, and an exhaust pressure adjusting part 8 is connected to the top side plane. The waste liquid part 7 is provided with a plurality of waste liquid paths, and waste liquid is discharged by the selected path by controlling the opening/closing operation of valves (a) and (b) according to the type of treatment liquid. The exhaust pressure adjusting part 8 controls the opening and closing of a damper so as to adjust the exhaust pressure and to control the pressure in the collecting box 6.
申请公布号 JPH07161629(A) 申请公布日期 1995.06.23
申请号 JP19930339307 申请日期 1993.12.02
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 OKUNO EIJI
分类号 G03F7/30;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/30
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