发明名称 SELF-CLEANNESS DIAGNOSTIC TYPE SUBSTRATE CLEANING DEVICE
摘要 PURPOSE:To diagnose the cleanness of a substrate route through which a test substrate passes by a method wherein the test substrate high in cleanness is used and made to pass a part of a processing route which corresponds to a process wherein either transfer processing or cleaning processing is carried out. CONSTITUTION:A test reticle high in cleanness and housed in a reticle library 11 is transferred to a foreign matter inspection section 12 through the intermediary of a transfer outer 17. When the reduction of the test reticle in cleanness is detected at the foreign matter inspection section 12, the reduction of the reticle library 11 or the transfer outer 17 in cleanness is confirmed. On the other hand, when the reduction of the test reticle in cleanness is not detected at the foreign matter inspection section 12, the cleanness of the reticle library 11 and the transfer route 17 is confirmed. When the reduction of a test reticle in cleanness is not detected, cleanness diagnosis is successively made with the same test reticle. By this setup, a region deteriorated in cleanness can be surely detected.
申请公布号 JPH07161676(A) 申请公布日期 1995.06.23
申请号 JP19930339765 申请日期 1993.12.06
申请人 NIKON CORP 发明人 ARAI TOSHITAKA
分类号 B08B13/00;G03F1/82;G03F7/20;H01L21/304 主分类号 B08B13/00
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