发明名称 LAYOUT METHOD FOR MASK PATTERN
摘要 PURPOSE:To perform efficient layout. CONSTITUTION:A mask pattern is laid out based on attributes and connection information 2 and 4 of elements constituting a circuit diagram, group information which consists of constraints related to shapes and arrangement or spatial positional relations of elements and is used to divide the elements, and grade information 8 which indicates priorities of layout of elements divided by group information 6.
申请公布号 JPH07160755(A) 申请公布日期 1995.06.23
申请号 JP19930309218 申请日期 1993.12.09
申请人 TOSHIBA CORP;TOSHIBA JOHO SYST KK 发明人 TASAI TAKAHIRO;YOSHIDA YOSHIHIRO
分类号 C23F1/00;G03F1/70;G06F17/50;H01L21/82 主分类号 C23F1/00
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