| 摘要 |
PURPOSE:To execute highly precise pattern inspection without requiring plural samples even in the case that a large number of pattern defects are included. CONSTITUTION:The picture of a whole object 14 to be inspected is fetched by a photographing system 1, and it is stored as an original picture in an original picture memory 3 after being converted into digital data by an A/D convertet 2. Next, the original picture is divided and read on the basis of a pitch set in a control unit 13 by a computing element 4, and a summed average picture about all divided pictures is calculated, and is stored as a reference picture in a reference picture memory 5. Afterwards, the reference picture is compared with the divided picture containing each individual object pattern to be inspected which is the divided original picture by a comparator 6, and the pattern defect is detected in detail. |
