PROCESS EQUIPMENT

摘要

PURPOSE:To provide a plasma process equipment wherein the generation of particles is restrained when an object to be processed is pressed on a mounting stand with a pressing mechanism or released from the stand, and the yield of the object to be processed can be increased. CONSTITUTION:The process equipment 1 is provided with a pressing mechanism 18 which presses and holds the outer peripheral part of an object W to be processed to the specified position of a mounting stand 4 with a pressing surface 22, and performs processing to the object W to be processed. Eaves 23 are formed on the inner peripheral side of the pressing surface 22.