PHASE SHIFT MASK AND ITS PRODUCTION

摘要

PURPOSE:To provide a phase shift mask with which transferred patterns of high dimensional accuracy are obtainable and a simple technique of producing this mask. CONSTITUTION:This phase shift mask has light shielding films 3 which are embedded in the selective regions on the front surface of a quartz substrate 1 consisting of a transparent material and are formed flush with the front surface of this quartz substrate 1 and transparent films 4 which constitute phase shifters disposed in the selective regions on the front surface of a quartz substrate 1 including the light shielding films 3. The transparent films 4 as the phase shifters are formed to a uniform film thickness and, therefore, the transferred mask patterns have the dimensional accuracy corresponding to the phase shift mask and the transfer is executed with the high dimensional accuracy in the case of exposing by using the phase shift mask.