| 摘要 |
PURPOSE:To provide a photomask and its production technique easy to produce and correct. CONSTITUTION:The photomask as a mask pattern 2 and an SOG film 3 formed on the surface of a glass substrate 1. The SOG film 3 consists of a material having smaller light transmittance than that of the glass substrate 1. By controlling the thickness of the SOG film 3, a light quantity transmitting through the SOG film 3 is controlled. Thereby, the correction of the photomask is made easy by controlling the film thickness of the SOG film 3 formed in contact with the area where the SOG film 3 is not formed to be the desired dimension of a pattern. Thus, a photomask having desired high accuracy is obtd. |
