| 摘要 |
<p>A method and apparatus for marking a surface with a predetermined pattern is described. The apparatus includes a surface marking mechanism (24) that supports a material dispenser (80). The material dispenser (80) is manipulated along a number of axes including an x-axis, a y-axis, and a z-axis. In addition, the material dispenser (80) is manipulated to rotate around a w-axis and to form a tilt angle with the w-axis. The surface marking mechanism (24) includes movement devices (56, 58, 60, 62) for initial positioning of the mechanism and for repositioning the mechanism to complete a selected pattern that does not fit within the border of the mechanism (24). The surface marking mechanism (24) is responsive to control signals from a controller (130). The control signals are derived from a mathematical model characterizing the spatial relationship between the predetermined pattern, the material dispenser (80), and the surface to be marked.</p> |
